Authors: Fritze, M Astolfi, DK Yost, DRW Wyatt, PW Liu, HY Forte, T Davis, P Curtis, A Preble, D Cann, S Denault, S Shaw, J Sullivan, N Brandom, R Mastovich, M

Citation: M. Fritze et al., Chromeless phase-shift masks used for sub-100nm SOICMOS transistors, SOL ST TECH, 43(7), 2000, pp. 116