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Results: 1-8 |
Results: 8
Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists
Authors: Mahorowala, AP Medeiros, DR
Citation: Ap. Mahorowala et Dr. Medeiros, Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists, J VAC SCI A, 19(4), 2001, pp. 1374-1378
Recent progress in electron-beam a resists for advanced mask-making
Authors: Medeiros, DR Aviram, A Guarnieri, CR Huang, WS Kwong, R Magg, CK Mahorowala, AP Moreau, WM Petrillo, KE Angelopoulos, M
Citation: Dr. Medeiros et al., Recent progress in electron-beam a resists for advanced mask-making, IBM J RES, 45(5), 2001, pp. 639-650
Transfer etching of bilayer resists in oxygen-based plasmas
Authors: Mahorowala, AP Babich, K Lin, Q Medeiros, DR Petrillo, K Simons, J Angelopoulos, M Sooriyakumaran, R Hofer, D Reynolds, GW Taylor, JW
Citation: Ap. Mahorowala et al., Transfer etching of bilayer resists in oxygen-based plasmas, J VAC SCI A, 18(4), 2000, pp. 1411-1419
Study of resolution limits due to intrinsic bias in chemically amplified photoresists
Authors: Postnikov, SV Stewart, MD Tran, HV Nierode, MA Medeiros, DR Cao, T Byers, J Webber, SE Wilson, CG
Citation: Sv. Postnikov et al., Study of resolution limits due to intrinsic bias in chemically amplified photoresists, J VAC SCI B, 17(6), 1999, pp. 3335-3338
Ferroelectric cyclic oligosiloxane liquid crystals
Authors: Medeiros, DR Hale, MA Hung, RJP Leitko, JK Willson, CG
Citation: Dr. Medeiros et al., Ferroelectric cyclic oligosiloxane liquid crystals, J MAT CHEM, 9(7), 1999, pp. 1453-1460
X-ray diffraction and torsional viscosity investigations of laterally linked S-C liquid crystal dimers
Authors: Hale, MA Medeiros, DR Dombrowski, KD Willson, CG
Citation: Ma. Hale et al., X-ray diffraction and torsional viscosity investigations of laterally linked S-C liquid crystal dimers, CHEM MATER, 11(9), 1999, pp. 2515-2519
Design of photoresists with reduced environmental impact. 1. Water-solubleresists based on photo-cross-linking of poly(vinyl alcohol)
Authors: Havard, JM Shim, SY Frechet, JMJ Lin, QH Medeiros, DR Willson, CG Byers, JD
Citation: Jm. Havard et al., Design of photoresists with reduced environmental impact. 1. Water-solubleresists based on photo-cross-linking of poly(vinyl alcohol), CHEM MATER, 11(3), 1999, pp. 719-725
Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)
Authors: Havard, JM Yoshida, M Pasini, D Vladimirov, N Frechet, JMJ Medeiros, DR Patterson, K Yamada, S Willson, CG Byers, JD
Citation: Jm. Havard et al., Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline), J POL SC PC, 37(9), 1999, pp. 1225-1236
Risultati: 1-8 |