Authors:
Jiang, LJ
Chen, X
Wang, XH
Xu, LQ
Stubhan, F
Merkel, KH
Citation: Lj. Jiang et al., a-SiCx : H films deposited by plasma-enhanced chemical vapor deposition atlow temperature used for moisture and corrosion resistant applications, THIN SOL FI, 352(1-2), 1999, pp. 97-101