Authors: Monget, C Joubert, O Inglebert, RL

Citation: C. Monget et al., Plasma polymerized methylsilane I: Characterization of thin photosensitivefilms for advanced lithography applications, J VAC SCI B, 18(5), 2000, pp. 2534-2542

Authors: Monget, C Joubert, O

Citation: C. Monget et O. Joubert, Plasma polymerized methylsilane. II. Performance for 248 nm lithography, J VAC SCI B, 18(2), 2000, pp. 785-792

Authors: Joubert, O Fuard, D Monget, C Weidman, T

Citation: O. Joubert et al., Plasma polymerized methylsilane. III. Process optimization for 193 nm lithography applications, J VAC SCI B, 18(2), 2000, pp. 793-798

Authors: Monget, C Joubert, O

Citation: C. Monget et O. Joubert, X-ray photoelectron spectroscopy analyses of oxide-masked organic polymersetched in high density plasmas using SO2/O-2 gas mixtures, J VAC SCI B, 17(4), 1999, pp. 1406-1412

Authors: Monget, C Fuard, D Joubert, O Panabiere, JP

Citation: C. Monget et al., Optimization of plasma polymerized methylsilane process for 248 and 193 nmlithography applications., MICROEL ENG, 46(1-4), 1999, pp. 349-352