Citation: A. Lousa et al., BCN thin films near the B4C composition deposited by radio frequency magnetron sputtering, DIAM RELAT, 9(3-6), 2000, pp. 502-505
Authors:
Mahmood, A
Muhl, S
Sansores, LE
Andrade, E
Citation: A. Mahmood et al., Dependency of reactive magnetron-sputtered SiC film quality on the deposition parameters, THIN SOL FI, 373(1-2), 2000, pp. 180-183
Authors:
Mendez, JM
Gaona-Couto, A
Muhl, S
Jimenez-Sandoval, S
Citation: Jm. Mendez et al., Vibrational and optical properties of carbon nitride films prepared by reactive magnetron sputtering, J PHYS-COND, 11(26), 1999, pp. 5225-5235
Authors:
Morrison, NA
Muhl, S
Rodil, SE
Ferrari, AC
Nesladek, M
Milne, WI
Robertson, J
Citation: Na. Morrison et al., The preparation, characterization and tribological properties of TA-C : H deposited using an electron cyclotron wave resonance plasma beam source, PHYS ST S-A, 172(1), 1999, pp. 79-90