Citation: Ss. Nathan et al., TRANSPORT OF SPUTTERED ATOMS IN FACING TARGETS SPUTTERING GEOMETRY - A NUMERICAL-SIMULATION STUDY, Journal of applied physics, 84(1), 1998, pp. 564-571
Citation: Ss. Nathan et al., STUDIES OF PROCESS PARAMETER CONTROLLED COMPOSITION VARIATION IN SPUTTERED YBA2CU3O7-X FILMS, Vacuum, 48(2), 1997, pp. 113-118
Citation: Ss. Nathan et al., EFFECT OF PROCESS PARAMETERS ON GLOW-DISCHARGE AND FILM THICKNESS UNIFORMITY IN FACING TARGET SPUTTERING, Thin solid films, 292(1-2), 1997, pp. 20-25