Citation: Fn. Dultsev et al., IRREGULAR SURFACE AND POROUS STRUCTURE OF SIO2-FILMS DEPOSITED AT LOW-TEMPERATURE AND LOW-PRESSURE, Journal of the Electrochemical Society, 145(7), 1998, pp. 2569-2572
Citation: Ll. Vasileva et al., KINETICS OF FORMATION OF SILICON DIOXIDE LAYERS DURING OXIDATION OF MONOSILANE IN THE PRESENCE OF AMMONIA, Kinetics and catalysis, 33(5-6), 1992, pp. 847-851