Authors: HOTOVY I BUC D HASCIK S NENNEWITZ O

Citation: I. Hotovy et al., CHARACTERIZATION OF NIO THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING, Vacuum, 50(1-2), 1998, pp. 41-44

Authors: SPIESS L NENNEWITZ O WEISHART H LINDNER J SKORUPA W ROMANUS H ERLER F PEZOLDT J

Citation: L. Spiess et al., ALUMINUM IMPLANTATION OF P-SIC FOR OHMIC CONTACTS, DIAMOND AND RELATED MATERIALS, 6(10), 1997, pp. 1414-1419

Authors: NENNEWITZ O SPIESS L BRETERNITZ V

Citation: O. Nennewitz et al., OHMIC CONTACTS TO P-TYPE 6H-SILICON CARBIDE, Applied surface science, 91(1-4), 1995, pp. 347-351

Authors: NENNEWITZ O SCHMIDT H PEZOLDT J STAUDEN T SCHAWOHL J SPIESS L

Citation: O. Nennewitz et al., RAPID THERMAL ANNEALING OF THIN ZNO FILMS, Physica status solidi. a, Applied research, 145(2), 1994, pp. 283-288