Authors:
LOUIS E
BIJKERK F
SHMAENOK L
VOORMA HJ
VANDERWIEL MJ
SCHLATMANN R
VERHOEVEN J
VANDERDRIFT EWJM
ROMIJN J
ROUSSEEUW BAC
VOSS F
DESOR R
NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70