SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES

Authors
LOUIS E BIJKERK F SHMAENOK L VOORMA HJ VANDERWIEL MJ SCHLATMANN R VERHOEVEN J VANDERDRIFT EWJM ROMIJN J ROUSSEEUW BAC VOSS F DESOR R NIKOLAUS B
Citation
E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
21
Issue
1-4
Year of publication
1993
Pages
67 - 70
Database
ISI
SICI code
0167-9317(1993)21:1-4<67:SPLUAH>2.0.ZU;2-6
Abstract
In this paper we present the status of a joint development programme o n soft x-ray projection lithography (SXPL) integrating work on high br ightness laser plasma sources. fabrication of multilayer x-ray mirrors . and patterning of reflection masks. We are in the process of optimiz ation of a laser-plasma x-ray source and measured the conversion-effic iency of laser light into x-rays. Furthermore we present results of et ching patterns in x-ray reflection masks and we discuss improved depos ition techniques to produce multilayer coatings with enhanced reflecti vity.