Authors: MATSUDA T NAKAMURA S IDE K NYUDO K YAE SJ NAKATO Y

Citation: T. Matsuda et al., OSCILLATORY BEHAVIOR IN ELECTROCHEMICAL DEPOSITION REACTION OF POLYCRYSTALLINE SILICON THIN-FILMS THROUGH REDUCTION OF SILICON TETRACHLORIDE IN A MOLTEN-SALT ELECTROLYTE, Chemistry Letters, (7), 1996, pp. 569-570