Authors: Nakayama, KS Sakurai, T Weaver, JH

Citation: Ks. Nakayama et al., Electrochemical fluorine source for ultrahigh vacuum dosing, J VAC SCI A, 18(5), 2000, pp. 2606-2607

Authors: Nakayama, KS Weaver, JH

Citation: Ks. Nakayama et Jh. Weaver, Si(100)-(2x1) etching with fluorine: Planar removal versus three dimensional fitting, PHYS REV L, 83(16), 1999, pp. 3210-3213