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Results: 1-9 |
Results: 9
Aluminum-induced crystallization of amorphous silicon (alpha-Si : H) at 150 degrees C
Authors: Kishore, R Hotz, C Naseem, HA Brown, WD
Citation: R. Kishore et al., Aluminum-induced crystallization of amorphous silicon (alpha-Si : H) at 150 degrees C, EL SOLID ST, 4(2), 2001, pp. G14-G16
Getting aggressive with passive devices - Thin-film integrated passive devices and the modern-day interconnect problem
Authors: Ulrich, RK Brown, WD Ang, SS Barlow, FD Elshabini, A Lenihan, TG Naseem, HA Nelms, DM Parkerson, J Schaper, LW Morcan, G
Citation: Rk. Ulrich et al., Getting aggressive with passive devices - Thin-film integrated passive devices and the modern-day interconnect problem, IEEE CIRC D, 16(5), 2000, pp. 16-25
A study of the high frequency performance of thin film capacitors for electronic packaging
Authors: Chen, KY Brown, WD Schaper, LW Ang, SS Naseem, HA
Citation: Ky. Chen et al., A study of the high frequency performance of thin film capacitors for electronic packaging, IEEE T AD P, 23(2), 2000, pp. 293-302
A critical review of chemical vapor-deposited (CVD) diamond for electronicapplications
Authors: Railkar, TA Kang, WP Windischmann, H Malshe, AP Naseem, HA Davidson, JL Brown, WD
Citation: Ta. Railkar et al., A critical review of chemical vapor-deposited (CVD) diamond for electronicapplications, CR R SOLID, 25(3), 2000, pp. 163-277
Modeling and electrical analysis of seamless high off-chip connectivity (SHOCC) interconnects
Authors: Afonso, S Schaper, LW Parkerson, JP Brown, WD Ang, SS Naseem, HA
Citation: S. Afonso et al., Modeling and electrical analysis of seamless high off-chip connectivity (SHOCC) interconnects, IEEE T AD P, 22(3), 1999, pp. 309-320
A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates
Authors: Malshe, AP Park, BS Brown, WD Naseem, HA
Citation: Ap. Malshe et al., A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates, DIAM RELAT, 8(7), 1999, pp. 1198-1213
A comparison of mechanical lapping versus chemical-assisted mechanical polishing and planarization of chemical vapor deposited (CVD) diamond
Authors: Ollison, CD Brown, WD Malshe, AP Naseem, HA Ang, SS
Citation: Cd. Ollison et al., A comparison of mechanical lapping versus chemical-assisted mechanical polishing and planarization of chemical vapor deposited (CVD) diamond, DIAM RELAT, 8(6), 1999, pp. 1083-1090
Effect of early methane introduction on the properties of nano-seeded MPCVD-diamond films
Authors: Shaik, AA Khan, MA Naseem, HA Brown, WD
Citation: Aa. Shaik et al., Effect of early methane introduction on the properties of nano-seeded MPCVD-diamond films, THIN SOL FI, 356, 1999, pp. 139-145
In situ analysis of aluminum enhanced crystallization of hydrogenated amorphous silicon (a-Si : H) using X-ray diffraction
Authors: Khalifa, FA Naseem, HA Shultz, JL Brown, WD
Citation: Fa. Khalifa et al., In situ analysis of aluminum enhanced crystallization of hydrogenated amorphous silicon (a-Si : H) using X-ray diffraction, THIN SOL FI, 356, 1999, pp. 343-346
Risultati: 1-9 |