Authors:
Monaghan, ML
Nigam, T
Houssa, M
De Gendt, S
Urbach, HP
de Bokx, PK
Citation: Ml. Monaghan et al., Characterization of silicon oxynitride films by grazing-emission X-ray fluorescence spectrometry, THIN SOL FI, 359(2), 2000, pp. 197-202
Authors:
Crupi, F
Degraeve, R
Groeseneken, G
Nigam, T
Maes, H
Citation: F. Crupi et al., Investigation and comparison of the noise in the gate and substrate current after soft-breakdown, JPN J A P 1, 38(4B), 1999, pp. 2219-2222
Citation: M. Houssa et al., Effect of extreme surface roughness on the electrical characteristics of ultra-thin gate oxides, SOL ST ELEC, 43(1), 1999, pp. 159-167
Authors:
Heyns, MM
Bearda, T
Cornelissen, I
De Gendt, S
Degraeve, R
Groeseneken, G
Kenens, C
Knotter, DM
Loewenstein, LM
Mertens, PW
Mertens, S
Meuris, M
Nigam, T
Schaekers, M
Teerlinck, I
Vandervorst, W
Vos, R
Wolke, K
Citation: Mm. Heyns et al., Cost-effective cleaning and high-quality thin gate oxides, IBM J RES, 43(3), 1999, pp. 339-350