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Results: 1-2 |
Results: 2
Lateral solid phase recrystallization from the crystal seed in Ge-ion-implanted amorphous silicon films by repetition rapid thermal annealing
Authors: Seo, JW Kokubo, Y Aya, Y Nohda, T Hamada, H Kuwano, H
Citation: Jw. Seo et al., Lateral solid phase recrystallization from the crystal seed in Ge-ion-implanted amorphous silicon films by repetition rapid thermal annealing, JPN J A P 1, 40(4A), 2001, pp. 2150-2154
Lateral solid-phase recrystallization from the crystal seed selectively formed by excimer laser annealing in Ge-ion-implanted amorphous silicon films
Authors: Seo, JW Akiyama, S Aya, Y Nohda, T Hamada, H Kajiyama, K Kanaya, M Kuwano, H
Citation: Jw. Seo et al., Lateral solid-phase recrystallization from the crystal seed selectively formed by excimer laser annealing in Ge-ion-implanted amorphous silicon films, JPN J A P 1, 39(9A), 2000, pp. 5063-5068
Risultati: 1-2 |