Authors: SAKAMOTO K FUEKI S YAMAZAKI S ABE T KOBAYASHI K NISHINO H SATOH T TAKEMOTO A OOKURA A OHNO M SAGOH S OAE Y YAMADA A KAI J YASUDA H

Citation: K. Sakamoto et al., ELECTRON-BEAM BLOCK EXPOSURE SYSTEM FOR 256M DYNAMIC RANDOM-ACCESS MEMORY LITHOGRAPHY, JPN J A P 1, 32(12B), 1993, pp. 6006-6011

Authors: SAKAMOTO K FUEKI S YAMAZAKI S ABE T KOBAYASHI K NISHINO H SATOH T TAKEMOTO A OOKURA A OONO M SAGO S OAE Y YAMADA A YASUDA H

Citation: K. Sakamoto et al., ELECTRON-BEAM BLOCK EXPOSURE SYSTEM FOR A 256-M DYNAMIC RANDOM-ACCESSMEMORY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2357-2361

Authors: KIUCHI T YAMADA A TAKAHASHI Y OAE Y NAKANO M KAI J YASUDA H KAWASHIMA K

Citation: T. Kiuchi et al., ACCURACY OF EXPOSURE DURING CONTINUOUS STAGE MOVEMENT IN A VARIABLE SHAPED VECTOR SCANNING EB LITHOGRAPHY SYSTEM, Microelectronic engineering, 21(1-4), 1993, pp. 149-152