Authors: OHFUJI SI ITSUMI M AKIYA H

Citation: Si. Ohfuji et al., DIELECTRIC-PROPERTIES OF UNANNEALED ECR-SPUTTERED (BA,SR)TIO3 FILMS UNDER DC-BIAS STRESSES, Integrated ferroelectrics, 16(1-4), 1997, pp. 209-217

Authors: TSUKADA M OHFUJI SI

Citation: M. Tsukada et Si. Ohfuji, INTERFACE REACTION OF AL W AND CHEMICAL-PROPERTIES OF AL-W BIMETALLICBONDING/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(5), 1995, pp. 2525-2531

Authors: TSUKADA M OHFUJI SI

Citation: M. Tsukada et Si. Ohfuji, IN-SITU X-RAY PHOTOEMISSION SPECTROSCOPIC STUDIES OF AL SIO2 INTERFACE FORMATION/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 1-6