Si. Ohfuji et al., DIELECTRIC-PROPERTIES OF UNANNEALED ECR-SPUTTERED (BA,SR)TIO3 FILMS UNDER DC-BIAS STRESSES, Integrated ferroelectrics, 16(1-4), 1997, pp. 209-217
Changes in leakage current and polarization hysteresis loops of (Ba0.5
5Sr0.45TiO3 (BST) films for capacitor applications are found after +3
V and -3 V dc-bias stress tests. An electron cyclotron resonance sputt
ering is used for depositing those 100-nm-thick films in Pt/BST/Pt str
uctures. Comparison of characteristics with Pt/BST/Ti (2 nm)/Pt(bottom
) structures suggests that barrier degradation due to oxygen deficienc
ies may occur near the interface of not only bottom electrodes but als
o top electrodes. Electron traps also seem to be generated in BST film
s. Polarization hysteresis data indicate that there is no clear ferroe
lectric hysteresis and that the shape of the loops is probably control
led by leakage current and charge trapping.