Authors:
SAKAMOTO K
FUEKI S
YAMAZAKI S
ABE T
KOBAYASHI K
NISHINO H
SATOH T
TAKEMOTO A
OOKURA A
OONO M
SAGO S
OAE Y
YAMADA A
YASUDA H
Citation: K. Sakamoto et al., ELECTRON-BEAM BLOCK EXPOSURE SYSTEM FOR A 256-M DYNAMIC RANDOM-ACCESSMEMORY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2357-2361