Citation: Rs. Goldman et al., NANOMETER-SCALE STUDIES OF NITRIDE ARSENIDE HETEROSTRUCTURES PRODUCEDBY NITROGEN PLASMA EXPOSURE OF GAAS/, Journal of electronic materials, 26(11), 1997, pp. 1342-1348
Authors:
BANDIC ZZ
MCGILL TC
HAUENSTEIN RJ
OSTEEN ML
Citation: Zz. Bandic et al., MICROSCOPIC PROCESSES DURING ELECTRON-CYCLOTRON-RESONANCE MICROWAVE NITROGEN PLASMA-ASSISTED MOLECULAR-BEAM EPITAXIAL-GROWTH OF GAN GAAS HETEROSTRUCTURES - EXPERIMENTS AND KINETIC MODELING/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2948-2951
Citation: Rs. Goldman et al., ATOMIC-SCALE STRUCTURE AND ELECTRONIC-PROPERTIES OF GAN GAAS SUPERLATTICES/, Applied physics letters, 69(24), 1996, pp. 3698-3700
Authors:
BANDIC ZZ
HAUENSTEIN RJ
OSTEEN ML
MCGILL TC
Citation: Zz. Bandic et al., KINETIC MODELING OF MICROSCOPIC PROCESSES DURING ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA-ASSISTED MOLECULAR-BEAM EPITAXIAL-GROWTH OF GAN GAAS-BASED HETEROSTRUCTURES/, Applied physics letters, 68(11), 1996, pp. 1510-1512
Authors:
HAUENSTEIN RJ
COLLINS DA
CAI XP
OSTEEN ML
MCGILL TC
Citation: Rj. Hauenstein et al., REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION STUDY OF NITROGEN PLASMA INTERACTIONS WITH A GAAS (100) SURFACE, Applied physics letters, 66(21), 1995, pp. 2861-2863