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Results:
1-6
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Results: 6
Roughness study of a positive tone high performance SCALPEL resist
Authors:
Ocola, LE Orphanos, PA Li, WY Waskiewicz, W Novembre, AE Sato, M
Citation:
Le. Ocola et al., Roughness study of a positive tone high performance SCALPEL resist, J VAC SCI B, 18(6), 2000, pp. 3435-3440
Monte Carlo study of High performance resists for SCALPEL nanolithography
Authors:
Ocola, LE Li, WY Kasica, RJ Blakey, MI Orphanos, PA Waskiewicz, WK Novembre, AE Sato, M
Citation:
Le. Ocola et al., Monte Carlo study of High performance resists for SCALPEL nanolithography, MICROEL ENG, 53(1-4), 2000, pp. 433-436
Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks
Authors:
Spector, SJ White, DL Tennant, DM Ocola, LE Novembre, AE Peabody, ML Wood, OR
Citation:
Sj. Spector et al., Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks, J VAC SCI B, 17(6), 1999, pp. 3003-3008
Progress toward a 30 nm silicon metal-oxide-semiconductor gate technology
Authors:
Tennant, DM Timp, GL Ocola, LE Green, M Sorsch, T Kornblit, A Klemens, F Kleiman, R Kim, Y Timp, W
Citation:
Dm. Tennant et al., Progress toward a 30 nm silicon metal-oxide-semiconductor gate technology, J VAC SCI B, 17(6), 1999, pp. 3158-3163
Lithography for sub-60 nm resist nanostructures
Authors:
Ocola, LE Tennant, D Timp, G Novembre, A
Citation:
Le. Ocola et al., Lithography for sub-60 nm resist nanostructures, J VAC SCI B, 17(6), 1999, pp. 3164-3167
Negative chemically amplified resist characterization for direct write andSCALPEL nanolithography
Authors:
Ocola, LE Biddick, CJ Tennant, DM Waskiewicz, WK Novembre, AE
Citation:
Le. Ocola et al., Negative chemically amplified resist characterization for direct write andSCALPEL nanolithography, J VAC SCI B, 16(6), 1998, pp. 3705-3708
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