Authors:
Nabatame, T
Hiratani, M
Kadoshima, M
Shimamoto, Y
Matsui, Y
Ohji, Y
Asano, I
Fujiwara, T
Suzuki, T
Citation: T. Nabatame et al., Properties of ruthenium films prepared by liquid source metalorganic chemical vapor deposition using Ru(EtCp)(2) with tetrahydrofuran solvent, JPN J A P 2, 39(11B), 2000, pp. L1188-L1190