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Authors: Nabatame, T Hiratani, M Kadoshima, M Shimamoto, Y Matsui, Y Ohji, Y Asano, I Fujiwara, T Suzuki, T
Citation: T. Nabatame et al., Properties of ruthenium films prepared by liquid source metalorganic chemical vapor deposition using Ru(EtCp)(2) with tetrahydrofuran solvent, JPN J A P 2, 39(11B), 2000, pp. L1188-L1190
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