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Citation: G. Teng et al., Bias printing of APSM resists for 180 nm contact holes, MICROEL ENG, 53(1-4), 2000, pp. 457-460

Authors: Rajaratnam, M Reilly, M Pai, D Kang, D Thackeray, J Georger, J Orsula, G

Citation: M. Rajaratnam et al., Development of APSM resists for sub-200nm contact holes, MICROEL ENG, 46(1-4), 1999, pp. 345-348