Authors: PAN SW REILLY MT DIFABRIZIO E LEONARD Q TAYLOR JW CERRINA F

Citation: Sw. Pan et al., AN OPTIMIZATION DESIGN METHOD FOR CHEMICALLY AMPLIFIED RESIST PROCESS-CONTROL, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 325-332

Authors: PAN SW REILLY MT TAYLOR JW CERRINA F

Citation: Sw. Pan et al., OPTIMIZATION DESIGN PROGRAM FOR CHEMICALLY AMPLIFIED RESIST PROCESS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2845-2849

Authors: HU YH PAN SW

Citation: Yh. Hu et Sw. Pan, SAPOSM - AN OPTIMIZATION METHOD APPLIED TO PARAMETER EXTRACTION OF MOSFET MODELS, IEEE transactions on computer-aided design of integrated circuits and systems, 12(10), 1993, pp. 1481-1487