Authors: SHARAFUTDINOV RG SKRYNNIKOV AV PARAKHNEVICH AV AYUPOV BM BADALIAN AM POLYAKOV OV BAKLANOV MR MOGILNIKOV KP BIRYUKOV SA

Citation: Rg. Sharafutdinov et al., HIGH-RATE DEPOSITION OF SI-H FILMS USING A FLOW PLASMA-CHEMICAL METHOD WITH ELECTRON-BEAM ACTIVATION, Journal of applied physics, 79(9), 1996, pp. 7274-7277

Authors: SHARAFUTDINOV RG BAKLANOV MR AYUPOV BM BADALYAN AM POLYAKOV OV SKRYTNIKOV AV PARAKHNEVICH AV MOGILNIKOV K BIRYUKOV SV

Citation: Rg. Sharafutdinov et al., CHARACTERISTICS OF PRECIPITATION PROCESSE S AND PROPERTIES OF SILICONLAYERS PREPARED BY JET PLASMA-CHEMICAL TECHNIQUES WITH ELECTRON-BEAM ACTIVATION OF GASES, Zurnal tehniceskoj fiziki, 65(1), 1995, pp. 181-185