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Citation: Gp. Patsis et al., THEORETICAL DISCUSSION OF DIFFUSION EFFECTS IN NEGATIVE CHEMICALLY AMPLIFIED RESISTS BASED ON CONTRAST CURVE SIMULATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2561-2564
Authors:
GLEZOS N
PATSIS GP
RAPTIS I
ARGITIS P
GENTILI M
GRELLA L
Citation: N. Glezos et al., APPLICATION OF A REACTION-DIFFUSION MODEL FOR NEGATIVE CHEMICALLY AMPLIFIED RESISTS TO DETERMINE ELECTRON-BEAM PROXIMITY CORRECTION PARAMETERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4252-4256