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DEPOSITION OF TIB2 AT LOW-TEMPERATURE WITH LOW RESIDUAL-STRESS BY A VACUUM-ARC PLASMA SOURCE
Authors: TREGLIO JR TRUJILLO S PERRY AJ
Citation: Jr. Treglio et al., DEPOSITION OF TIB2 AT LOW-TEMPERATURE WITH LOW RESIDUAL-STRESS BY A VACUUM-ARC PLASMA SOURCE, Surface & coatings technology, 61(1-3), 1993, pp. 315-319
ARC-ENHANCED GLOW-DISCHARGE IN VACUUM-ARC MACHINES
Authors: VETTER J BURGMER W PERRY AJ
Citation: J. Vetter et al., ARC-ENHANCED GLOW-DISCHARGE IN VACUUM-ARC MACHINES, Surface & coatings technology, 59(1-3), 1993, pp. 152-155
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