Citation: Mp. Garrity et al., PARTICLE FORMATION RATES IN SULFUR-HEXAFLUORIDE PLASMA-ETCHING OF SILICON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 550-555
Citation: Mp. Garrity et al., FLUID SIMULATIONS OF PARTICLE CONTAMINATION IN POSTPLASMA PROCESSES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2939-2944