Authors: CHEN L PIAZZA TW SCHMIDT BE KELSEY JE KALOYEROS AE HAZELTON DW WALKER MS LUO L DYE RC MAGGIORE CJ WILKINS DJ KNORR DB

Citation: L. Chen et al., ON THE EFFECT OF PROCESSING PARAMETERS IN THE CHEMICAL-VAPOR-DEPOSITION OF YBA2CU3O7-DELTA THIN-FILMS ON POLYCRYSTALLINE SILVER, Journal of applied physics, 73(11), 1993, pp. 7563-7570