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Citation: C. Pierrat et al., MULTIPLE-LAYER BLANK STRUCTURE FOR PHASE-SHIFTING MASK FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 63-68

Authors: PIERRAT C VAIDYA S

Citation: C. Pierrat et S. Vaidya, REQUIRED OPTICAL CHARACTERISTICS OF MATERIALS FOR PHASE-SHIFTING MASKS, Applied optics, 34(22), 1995, pp. 4923-4928

Authors: YUAN CM POL V GAROFALO J PIERRAT C

Citation: Cm. Yuan et al., IMPLEMENTING ATTENUATED PHASE-SHIFT MASKS FOR CONTACTS IN PRODUCTION, JPN J A P 1, 33(12B), 1994, pp. 6796-6800

Authors: PIERRAT C DEMARCO J VELLA RM VAIDYA S ROLFSON B JOHNSON JC

Citation: C. Pierrat et al., REPAIR OF PHASE-SHIFTING MASK DEFECTS USING A NOVEL PLANARIZATION TECHNIQUE WITH CONVENTIONAL BLANKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(5), 1994, pp. 3057-3059

Authors: MARCHMAN HM VAIDYA S PIERRAT C GRIFFITH J

Citation: Hm. Marchman et al., METROLOGY FOR PHASE-SHIFTING MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2482-2486

Authors: KOSTELAK RL PIERRAT C GAROFALO JG VAIDYA S

Citation: Rl. Kostelak et al., PRINTING OF PHASE-SHIFTING MASK DEFECTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2705-2713