Authors: PETRILLO KE POMERENE ATS BABICH ED SEEGER DE HOFER D BREYTA G ITO H

Citation: Ke. Petrillo et al., EFFECT OF PHOTO ACID GENERATOR CONCENTRATION ON THE PROCESS LATITUDE OF A CHEMICALLY AMPLIFIED RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3863-3867