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Results: 1-25 | 26-30 |
Results: 26-30/30
THE BEHAVIOR OF AMORPHOUS SILICA COATINGS AT HIGH-TEMPERATURES IN AGGRESSIVE ENVIRONMENTS
Authors: AYRES CF BENNETT MJ GOHIL DD LEON B PEREZAMOR M POU J SAUNDERS SRJ
Citation: Cf. Ayres et al., THE BEHAVIOR OF AMORPHOUS SILICA COATINGS AT HIGH-TEMPERATURES IN AGGRESSIVE ENVIRONMENTS, Journal de physique. IV, 3(C9), 1993, pp. 855-863
AUTOMATIC EVALUATION OF THE PERFORMANCE OF CORROSION-RESISTANT LCVD SILICA COATINGS
Authors: POU J SPENCER SJ GARCIA E FERNANDEZ D GONZALEZ P LEON B SAUNDERS SRJ PEREZAMOR M
Citation: J. Pou et al., AUTOMATIC EVALUATION OF THE PERFORMANCE OF CORROSION-RESISTANT LCVD SILICA COATINGS, Journal de physique. IV, 3(C9), 1993, pp. 901-908
STUDY OF THE GAS-PHASE PARAMETERS AFFECTING THE SILICON-OXIDE FILM DEPOSITION INDUCED BY AN ARF LASER
Authors: GONZALEZ P FERNANDEZ D POU J GARCIA E SERRA J LEON B PEREZAMOR M SZORENYI T
Citation: P. Gonzalez et al., STUDY OF THE GAS-PHASE PARAMETERS AFFECTING THE SILICON-OXIDE FILM DEPOSITION INDUCED BY AN ARF LASER, Applied physics. A, Solids and surfaces, 57(2), 1993, pp. 181-185
THE ROLE OF SILANE AND N2O IN THE CO2 LASER-CVD OF SILICON-OXIDE FILMS
Authors: FERNANDEZ D GONZALEZ P POU J GARCIA E SERRA J LEON B PEREZAMOR M
Citation: D. Fernandez et al., THE ROLE OF SILANE AND N2O IN THE CO2 LASER-CVD OF SILICON-OXIDE FILMS, Applied surface science, 69(1-4), 1993, pp. 281-284
THE ROLE OF THE BUFFER GAS IN THE ARF LASER-CHEMICAL VAPOR-DEPOSITIONOF SILICON-OXIDE
Authors: GONZALEZ P POU J FERNANDEZ D GARCIA E SERRA J LEON B PEREZAMOR M
Citation: P. Gonzalez et al., THE ROLE OF THE BUFFER GAS IN THE ARF LASER-CHEMICAL VAPOR-DEPOSITIONOF SILICON-OXIDE, Thin solid films, 230(1), 1993, pp. 35-38
Risultati: 1-25 | 26-30 |