Authors: LAUDON M FISHER A ENGELSTAD R CERRINA F CUMMINGS K DAUKSHER W RESNICK D JOHNSON W PUISTO D

Citation: M. Laudon et al., PREDICTION OF INPLANE DISTORTIONS DUE TO MASK FABRICATION PROCESSES, Microelectronic engineering, 35(1-4), 1997, pp. 549-552

Authors: ACOSTA RE PUISTO D

Citation: Re. Acosta et D. Puisto, IMAGE PLACEMENT ERRORS IN X-RAY MASKS INDUCED BY CHANGES IN RESIST STRESS DURING ELECTRON-BEAM WRITING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4354-4358

Authors: PUISTO D STURANS M LAWLISS M

Citation: D. Puisto et al., OVERLAY ENHANCEMENT WITH PRODUCT-SPECIFIC EMULATION IN ELECTRON-BEAM LITHOGRAPHY TOOLS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3436-3439

Authors: GROVES TR HARTLEY JG PFEIFFER HC PUISTO D BAILEY DK

Citation: Tr. Groves et al., ELECTRON-BEAM LITHOGRAPHY TOOL FOR MANUFACTURE OF X-RAY MASKS, IBM journal of research and development, 37(3), 1993, pp. 411-419