OVERLAY ENHANCEMENT WITH PRODUCT-SPECIFIC EMULATION IN ELECTRON-BEAM LITHOGRAPHY TOOLS

Authors
PUISTO D STURANS M LAWLISS M
Citation
D. Puisto et al., OVERLAY ENHANCEMENT WITH PRODUCT-SPECIFIC EMULATION IN ELECTRON-BEAM LITHOGRAPHY TOOLS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3436-3439
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
6
Year of publication
1994
Pages
3436 - 3439
Database
ISI
SICI code
1071-1023(1994)12:6<3436:OEWPEI>2.0.ZU;2-M