Authors: CZUPRYNSKI P JOUBERT O VALLIER L PUTTOCK M HEITZMANN M

Citation: P. Czuprynski et al., X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSES OF METAL STACKS ETCHED IN CL-2 BCL3 HIGH-DENSITY PLASMAS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 147-158

Authors: IRMSCHER M HOFFLINGER B REUTER C SPRINGER R STAUFFER C PUTTOCK M

Citation: M. Irmscher et al., TOP SURFACE IMAGING PROCESS AT AND BELOW QUARTER-MICRON RESOLUTION AND PATTERN TRANSFER INTO METAL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2605-2609

Authors: PUTTOCK M

Citation: M. Puttock, PROBLEMS AND SOLUTIONS FOR LOW-PRESSURE, HIGH-DENSITY, INDUCTIVELY-COUPLED PLASMA DRY ETCH APPLICATIONS, Surface & coatings technology, 97(1-3), 1997, pp. 10-14