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Results:
1-10
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Results: 10
Authors:
Evstigneev, M
Pankov, V
Prince, RH
Citation: M. Evstigneev et al., Application of the method of moments for calculating the dynamic response of periodically driven nonlinear stochastic systems, J PHYS A, 34(12), 2001, pp. 2595-2605
Authors:
Alonso, JC
Pichardo, E
Pankov, V
Ortiz, A
Citation: Jc. Alonso et al., Effect of hydrogen dilution on the structure of SiOF films prepared by remote plasma enhanced chemical vapor deposition from SiF4-based plasmas, J VAC SCI A, 18(6), 2000, pp. 2827-2834
Authors:
Ortiz, A
Alonso, JC
Pankov, V
Huanosta, A
Andrade, E
Citation: A. Ortiz et al., Characterization of amorphous aluminum oxide films prepared by the pyrosolprocess, THIN SOL FI, 368(1), 2000, pp. 74-79
Authors:
Ortiz, A
Alonso, JC
Pankov, V
Citation: A. Ortiz et al., Photo and electroluminescence from terbium doped zinc sulfide films deposited by spray pyrolysis, J MAT S-M E, 10(7), 1999, pp. 503-507
Authors:
Leo, G
Rella, R
Siciliano, P
Capone, S
Alonso, JC
Pankov, V
Ortiz, A
Citation: G. Leo et al., Sprayed SnO2 thin films for NO2 sensors, SENS ACTU-B, 58(1-3), 1999, pp. 370-374
Authors:
Pankov, V
Alonso, JC
Ortiz, A
Citation: V. Pankov et al., Moisture stability and structure relaxation processes in plasma-deposited SiOF films, J VAC SCI A, 17(6), 1999, pp. 3166-3171
Authors:
Guadarrama, P
Fomina, L
Pankov, V
Matus, W
Fomine, S
Citation: P. Guadarrama et al., Solid-supported synthesis of hyperbranched polymer with discrete conjugated units, POLYM J, 31(5), 1999, pp. 423-428
Authors:
Ortiz, A
Alonso, JC
Pankov, V
Albarran, D
Citation: A. Ortiz et al., Violet-blue photoluminescence in aluminium oxide films prepared by ultrasonic spray pyrolysis, J LUMINESC, 81(1), 1999, pp. 45-51
Authors:
Pankov, V
Alonso, JC
Ortiz, A
Citation: V. Pankov et al., Analysis of structural changes in plasma-deposited fluorinated silicon dioxide films caused by fluorine incorporation using ring-statistics based mechanism, J APPL PHYS, 86(1), 1999, pp. 275-280
Authors:
Pankov, V
Alonso, JC
Ortiz, A
Citation: V. Pankov et al., The effect of hydrogen addition on the fluorine doping level of SiOF filmsprepared by remote plasma-enhanced chemical vapor deposition using SiF4-based plasmas, JPN J A P 1, 37(11), 1998, pp. 6135-6141
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