Authors: Pawloski, AR",Christian,"Nealey, PF

Citation: Pf. Pawloski, Ar",christian,"nealey, A standard addition technique to quantify photoacid generation in chemically amplified photoresist, CHEM MATER, 13(11), 2001, pp. 4154-4162

Authors: Szmanda, CR Brainard, RL Mackevich, JF Awaji, A Tanaka, T Yamada, Y Bohland, J Tedesco, S Dal'Zotto, B Bruenger, W Torkler, M Fallmann, W Loeschner, H Kaesmaier, R Nealey, PM Pawloski, AR

Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361

Authors: Pawloski, AR Torres, JA Nealey, PF de Pablo, JJ

Citation: Ar. Pawloski et al., Applications of molecular modeling in nanolithography, J VAC SCI B, 17(6), 1999, pp. 3371-3378