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Results: 4

Authors: Liddle, JA Blakey, MI Bolan, K Farrow, RC Gallatin, GM Kasica, R Katsap, V Knurek, CS Li, J Mkrtchyan, M Novembre, AE Ocola, L Orphanos, PA Peabody, ML Stanton, ST Teffeau, K Waskiewicz, WK Munro, E
Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481

Authors: Spector, SJ White, DL Tennant, DM Ocola, LE Novembre, AE Peabody, ML Wood, OR
Citation: Sj. Spector et al., Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks, J VAC SCI B, 17(6), 1999, pp. 3003-3008

Authors: Novembre, AE Blakey, MI Farrow, RC Kasica, RJ Knurek, CS Liddle, JA Peabody, ML
Citation: Ae. Novembre et al., Pattern processing results and characteristics for SCALPEL masks, MICROEL ENG, 46(1-4), 1999, pp. 271-274

Authors: Liddle, JA Johnson, JA Cirelli, R Mkrtchyan, MM Novembre, AE Peabody, ML
Citation: Ja. Liddle et al., Quantitation of latent resist images using photon tunneling microscopy, J VAC SCI B, 16(6), 1998, pp. 3651-3654
Risultati: 1-4 |