Authors:
Ziegler, Y
Daudrix, V
Droz, C
Platz, R
Wyrsch, N
Shah, A
Citation: Y. Ziegler et al., More stable low gap a-Si : H layers deposited by PE-CVD at moderately hightemperature with hydrogen dilution, SOL EN MAT, 66(1-4), 2001, pp. 413-419
Citation: R. Platz et S. Wagner, Intrinsic microcrystalline silicon by plasma-enhanced chemical vapor deposition from dichlorosilane, APPL PHYS L, 73(9), 1998, pp. 1236-1238