Authors: Singh, R Fakhruddin, M Poole, KF

Citation: R. Singh et al., Rapid photothermal processing as a semiconductor manufacturing technology for the 21st century, APPL SURF S, 168(1-4), 2000, pp. 198-203

Authors: Tekleab, D Poole, KF Singh, R Carroll, DL Harrell, WR

Citation: D. Tekleab et al., Modeling early failure in integrated circuit interconnect, MICROEL REL, 40(6), 2000, pp. 991-996

Authors: Singh, R Parihar, V Chen, YN Poole, KF Nimmagadda, SV Vedula, L

Citation: R. Singh et al., Importance of rapid photothermal processing in defect reduction and process integration, IEEE SEMIC, 12(1), 1999, pp. 36-43

Authors: Venkataraman, S Singh, R Parihar, V Poole, KF Rohatgi, A Yeludur, V Ebong, A

Citation: S. Venkataraman et al., A study of the effect of ultraviolet (UV) and vacuum ultraviolet (VUV) photons on the minority carrier lifetime of single crystal silicon processed by rapid thermal and rapid photothermal processing, J ELEC MAT, 28(12), 1999, pp. 1394-1398