Authors: Fritze, M Burns, J Wyatt, PW Chen, CK Gouker, P Chen, CL Keast, C Astolfi, D Yost, D Preble, D Curtis, A Davis, P Cann, S Deneault, S Liu, HY

Citation: M. Fritze et al., Sub-100 nm silicon on insulator complimentary metal-oxide semiconductor transistors by deep ultraviolet optical lithography, J VAC SCI B, 18(6), 2000, pp. 2886-2890

Authors: Fritze, M Astolfi, DK Yost, DRW Wyatt, PW Liu, HY Forte, T Davis, P Curtis, A Preble, D Cann, S Denault, S Shaw, J Sullivan, N Brandom, R Mastovich, M

Citation: M. Fritze et al., Chromeless phase-shift masks used for sub-100nm SOICMOS transistors, SOL ST TECH, 43(7), 2000, pp. 116

Authors: Fritze, M Astolfi, D Liu, H Chen, CK Suntharalingam, V Preble, D Wyatt, PW

Citation: M. Fritze et al., Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits, J VAC SCI B, 17(2), 1999, pp. 345-349