Authors:
Paillard, V
Puech, P
Sirvin, R
Hamma, S
Cabarrocas, PRI
Citation: V. Paillard et al., Measurement of the in-depth stress profile in hydrogenated microcrystalline silicon thin films using Raman spectrometry, J APPL PHYS, 90(7), 2001, pp. 3276-3279
Authors:
Puech, P
Pinel, S
Jasinevicius, RG
Pizani, PS
Citation: P. Puech et al., Mapping the three-dimensional strain field around a microindentation on silicon using polishing and Raman spectroscopy, J APPL PHYS, 88(8), 2000, pp. 4582-4585
Authors:
de Mauduit, B
Bourgerette, C
Paillard, V
Puech, P
Caussat, B
Citation: B. De Mauduit et al., Structure of mixed-phase LPCVD silicon films as a function of operating conditions, J PHYS IV, 9(P8), 1999, pp. 1091-1098
Authors:
Paillard, V
Puech, P
Temple-Boyer, P
Caussat, B
Scheid, E
Couderc, JP
de Mauduit, B
Citation: V. Paillard et al., Improved characterization of polycrystalline silicon film, by resonant Raman scattering, THIN SOL FI, 337(1-2), 1999, pp. 93-97
Authors:
Paillard, V
Puech, P
Laguna, MA
Carles, R
Kohn, B
Huisken, F
Citation: V. Paillard et al., Improved one-phonon confinement model for an accurate size determination of silicon nanocrystals, J APPL PHYS, 86(4), 1999, pp. 1921-1924