Authors:
Heng, CL
Sun, YK
Wang, ST
Chen, Y
Qiao, YP
Zhang, BR
Ma, ZC
Zong, WH
Qin, GG
Citation: Cl. Heng et al., Electroluminescence from semitransparent au film/nanometer SiO2/nanometer Si/nanometer SiO2/n(+)-Si structure under reverse bias, APPL PHYS L, 77(10), 2000, pp. 1416-1418
Citation: Ds. Xu et al., Optical absorption and photoluminescence studies of free-standing porous silicon films with high porosities, J PHYS CH B, 103(26), 1999, pp. 5468-5471
Citation: Cl. Heng et al., Influences of thicknesses of SiO2 layers on electroluminescence from amorphous Si/SiO2 superlattices, PHYSICA B, 270(1-2), 1999, pp. 104-109
Authors:
Qin, GG
Bai, GF
Li, AP
Ma, SY
Sun, YK
Zhang, BR
Ma, ZC
Zong, WH
Citation: Gg. Qin et al., A comparative study of electroluminescence from nanosize Si particle embedded silicon oxide films and that from nanosize Ge particle embedded siliconoxide films, THIN SOL FI, 338(1-2), 1999, pp. 131-135
Citation: Ds. Xu et al., Optical properties and luminescence mechanism of oxidized free-standing porous silicon films, J APPL PHYS, 86(4), 1999, pp. 2066-2072
Authors:
Sun, WH
Chen, KM
Yang, ZJ
Li, J
Tong, YZ
Jin, SX
Zhang, GY
Zhang, QL
Qin, GG
Citation: Wh. Sun et al., Using Fourier transform infrared grazing incidence reflectivity to study local vibrational modes in GaN, J APPL PHYS, 85(9), 1999, pp. 6430-6433
Citation: Yq. Wang et al., Near-ultraviolet and near-infrared electroluminescence from an indium-tin-oxide film native Si oxide/p-Si structure, APPL PHYS L, 74(25), 1999, pp. 3815-3817
Citation: Gg. Qin et al., Synchronized swinging of electroluminescence intensity and peak wavelengthwith Si layer thickness in Au/SiO2/nanometer Si/SiO2/p-Si structures, APPL PHYS L, 74(15), 1999, pp. 2182-2184
Citation: Ds. Xu et al., Preparation and characterization of freestanding porous silicon films withhigh porosities, EL SOLID ST, 1(5), 1998, pp. 227-229
Citation: Gg. Qin, Extended quantum confinement luminescence center model for photoluminescence from oxidized porous silicon and nanometer-Si-particle- or nanometer-Ge-particle-embedded silicon oxide films, MATER RES B, 33(12), 1998, pp. 1857-1866