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Authors: THACKERAY J FEDYNYSHYN TH KANG D RAJARATNAM MM WALLRAFF G OPITZ J HOFER D
Citation: J. Thackeray et al., CORRELATION OF UVIIHS RESIST CHEMISTRY TO DISSOLUTION RATE MEASUREMENTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4267-4271
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