Authors: WESTERWELLE U BAHR G GRUTZNER G REUTHER F

Citation: U. Westerwelle et al., PARTIALLY CARBOXYMETHYLATED NOVOLAKS FOR PHOTORESIST SYSTEMS - NEW PHOTORESISTS FOR DEVELOPMENT UNDER MILDLY ALKALINE CONDITIONS, Microelectronic engineering, 42, 1998, pp. 343-346

Authors: BLEIDIESSEL G GRUETZNER G REUTHER F FEHLBERG S LOECHEL B MACIOSSEK A

Citation: G. Bleidiessel et al., DEPENDENCE OF THE QUALITY OF THICK RESIST STRUCTURES ON RESIST BAKING, Microelectronic engineering, 42, 1998, pp. 433-436

Authors: REUTHER F PFEIFFER K GOERING H BECKMANN S LORKOWSKI HJ

Citation: F. Reuther et al., STABLE ELECTROOPTICAL GUEST-HOST POLYMERS BASED ON CROSS-LINKED ALLYLCOMPOUNDS, Journal of macromolecular science. Pure and applied chemistry, A33(4), 1996, pp. 491-508

Authors: SCHMIDT A EHRFELD W LEHR H MULLER L REUTHER F SCHMIDT M ZETTERER T

Citation: A. Schmidt et al., ALIGNED DOUBLE-EXPOSURE IN DEEP X-RAY-LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 235-238