Authors:
GOGOLIDES E
VAUVERT P
RHALLABI A
TURBAN G
Citation: E. Gogolides et al., COMPLETE PLASMA PHYSICS, PLASMA CHEMISTRY, AND SURFACE-CHEMISTRY SIMULATION OF SIO2 AND SI ETCHING IN CF4 PLASMAS, Microelectronic engineering, 42, 1998, pp. 391-394
Authors:
MANTZARIS NV
GOGOLIDES E
BOUDOUVIS AG
RHALLABI A
TURBAN G
Citation: Nv. Mantzaris et al., SURFACE AND PLASMA SIMULATION OF DEPOSITION PROCESSES - CH4 PLASMAS FOR THE GROWTH OF DIAMOND-LIKE CARBON, Journal of applied physics, 79(7), 1996, pp. 3718-3729
Citation: E. Gogolides et al., RF PLASMAS IN METHANE - PREDICTION OF PLASMA PROPERTIES AND NEUTRAL RADICAL DENSITIES WITH COMBINED GAS-PHASE PHYSICS AND CHEMISTRY MODEL, JPN J A P 1, 34(1), 1995, pp. 261-270
Citation: E. Gogolides et al., RADIOFREQUENCY GLOW-DISCHARGES IN METHANE GAS - MODELING OF THE GAS-PHASE PHYSICS AND CHEMISTRY, Journal of physics. D, Applied physics, 27(4), 1994, pp. 818-825