Citation: H. Rohdin et al., INTERFACIAL GATE RESISTANCE IN SCHOTTKY-BARRIER-GATE FIELD-EFFECT TRANSISTORS, I.E.E.E. transactions on electron devices, 45(12), 1998, pp. 2407-2416
Authors:
ROHDIN H
NAGY A
ROBBINS V
SU CY
WAKITA AS
SEEGER J
HWANG T
CHYE P
GREGORY PE
BAHL ST
KELLERT FG
STUDEBAKER LG
DAVANZO DC
JOHNSEN S
Citation: H. Rohdin et al., 0.1-MU-M GATE-LENGTH ALINAS GAINAS/GAAS MODFET MMIC PROCESS FOR APPLICATIONS IN HIGH-SPEED WIRELESS COMMUNICATIONS/, HEWLETT-PAC, 49(1), 1998, pp. 37-38
Authors:
WAKITA AS
SU CY
ROHDIN H
LIU HY
LEE A
SEEGER J
ROBBINS VM
Citation: As. Wakita et al., NOVEL HIGH-YIELD TRILAYER RESIST PROCESS FOR 0.1 MU-M T-GATE FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2725-2728
Citation: H. Rohdin et al., APPLICATION-ORIENTED 33-GHZ E D-PMODFET STATIC PRESCALER FABRICATED USING OPTICAL LITHOGRAPHY/, I.E.E.E. transactions on electron devices, 42(9), 1995, pp. 1695-1697