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Citation: Wj. Dauksher et al., Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks, MICROEL ENG, 57-8, 2001, pp. 607-612

Authors: Kaganovich, ID Economou, DJ Ramamurthi, BN Midha, V

Citation: Id. Kaganovich et al., Negative ion density fronts during ignition and extinction of plasmas in electronegative gases, PHYS REV L, 84(9), 2000, pp. 1918-1921

Authors: Kaganovich, ID Ramamurthi, BN Economou, DJ

Citation: Id. Kaganovich et al., Self-trapping of negative ions due to electron detachment in the afterglowof electronegative gas plasmas, APPL PHYS L, 76(20), 2000, pp. 2844-2846