Authors:
Krishnamoorthy, A
Chanda, K
Murarka, SP
Ramanath, G
Ryan, JG
Citation: A. Krishnamoorthy et al., Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization, APPL PHYS L, 78(17), 2001, pp. 2467-2469
Authors:
Ramanath, G
Greene, JE
Petrov, I
Baker, JE
Allen, LH
Gillen, G
Citation: G. Ramanath et al., Channeling-induced asymmetric distortion of depth profiles from polycrystalline-TiN/Ti/TiN(001) trilayers during secondary ion mass spectrometry, J VAC SCI B, 18(3), 2000, pp. 1369-1374
Authors:
McInerney, EJ
Srinivasan, E
Smith, DC
Ramanath, G
Citation: Ej. Mcinerney et al., Kinetic rate expression for tungsten chemical vapor deposition in different WF6 flow regimes from step coverage measurements, Z METALLKUN, 91(7), 2000, pp. 573-580
Authors:
Ramanath, G
Greene, JE
Carlsson, JRA
Allen, LH
Hornback, VC
Allman, DJ
Citation: G. Ramanath et al., W deposition and titanium fluoride formation during WF6 reduction by Ti: Reaction path and mechanisms, J APPL PHYS, 85(3), 1999, pp. 1961-1969