Authors: Lindsay, R Lauwers, A de Potter, M Roelandts, N Vrancken, C Maex, K

Citation: R. Lindsay et al., Optimized thermal processing for Ti-capped CoSi2 for 0.13 mu m technology, MICROEL ENG, 55(1-4), 2001, pp. 157-162

Authors: Lauwers, A Besser, P Gutt, T Satta, A de Potter, M Lindsay, R Roelandts, N Loosen, F Jin, S Bender, H Stucchi, M Vrancken, C Deweerdt, B Maex, K

Citation: A. Lauwers et al., Comparative study of Ni-silicide and Co-silicide for sub 0.25-mu m technologies, MICROEL ENG, 50(1-4), 2000, pp. 103-116